Waterloo
Hacker Fab

A low-cost, open source semiconductor fab at the University of Waterloo. Part of Hacker Fab

Fab Capabilities

Using a TI DLP projector to create precise patterns for semiconductor fabrication. Minimum feature size achieved: 6 micron

With vacuum chuck for uniform application of photoresist and other materials.

High-temperature (1200°C) furnace for thermal oxidation and annealing processes.

For thin film deposition. Version 2 currently in development.

Reactive Ion Etcher with RF power supply for plasma etching. Currently in progress.